ATC ORION 8 UHV

Sputtering of multilayer and composite metal, dielectric and magnetic films.

Manufacturer: AJA International, USA
Year: 2008
Location: room 275

Main features:  
Five independent magnetron sputtering sources (2 DC and 3 RF power) 
Turbomolecular pumping system  
vacuum: not less than 5*10–7 Torr
Rotating substrate holder  
heating: up to 800 °C
Substrate holder cooled by liquid nitrogen  
Three independent gas feed lines  
Computer control system  
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