1. Optical microscopy 
    1. Kinetics and object's statics visualization
      1. in transmitted light
      2. in reflected light 
      3. in polarized light 
      4. in bright field regime
      5. in dark field regime
      6. in phase contrast regime
    2. Image processing 
      1. Corrective action and artefact removing
      2. Geometrical and statistics parameters determination
    3. Standard investigation includes
      1. Visualization of surface and volume structures of investigated materials in different areas of a sample
      2. Primary pattern processing
    4. Additional features
      1. Image analysis knowhow development
    5. Equipment
      1. Motor-operated optical microscope Olympus BX61
      2. Optical microscope Olympus BX51
      3. Software solution for registration and processing of  SIAMS Photolab images
  2. Scanning laser confocal microscopy and Raman-scattering spectroscopy
    1. 3D distribution of optical, phase and structural inhomogeneities 
    2. Attestation of carbon nano-materials 
    3. Measurements of raman spectrums with high wavelength resolution 
    4. Combination of spatial distribution of objects’ optical properties, phase structure and surface topography
    5. Equipment
      1. Probe spectroscopic complex  Ntegra Spectra
      2. Confocal microscopy system of Raman scattering  WiTec Alpha 300 AR
  3. Mechanical and optical profilometry
    1. Measurement of surface topography with sub-nanometer vertical resolution
    2. 3D imaging of surface topography
    3. Roughness measurements 
    4. Surface thickness measurements 
    5. Equipment
      1. Optical profilometer WYKO NT 1100
  4. SPM investigation
    1. Measurement and 3D imaging of surface topography 
    2. Measurement of hardness and elasticity modulus in nanoindentation regime
    3. Current and force nanolithography 
    4. Visualization and linear sizes estimation of nanoparticles, nanotubes, nanocrystalline material grains and other nano-materials 
    5. Visualization of magnetic and ferroelectric domain structures 
    6. Bioobjects morphology investigation 
    7. Measurement of spatial inhomogeneity of mechanical, optical, magnetic, electrical and other properties 
      1. Options: measurements in external magnet field:
        1. Horizontal field up to +/- 0,2Т
        2. Vertical field +/- 0,02Т
    8. Standard surface topography investigation
      1. Measurements in two different areas of a sample
      2. Three scans with different zooming in each investigated area
      3. Images preliminary processing
    9. Standard investigation of hardness and elasticity modulus
      1. Material’s hardness measurement in two different areas of a sample
      2. Surface scrabbing with four different pressures
      3. Scanning of the scratches under investigation
      4. Image processing, retrieving of information on the material’s hardness
    10. Equipment
      1. Probe nanolaboratory NTEGRA-Prima
      2. Scanning probe microscope MFP 3D SA
      3. Probe nanolaboratory NTEGRA-Aura
      4. Probe nanolaboratory NTEGRA-Therma
  5. Scanning electronic-ionic microscopy
    1. Relief topography measurements
    2. Structural analysis with diffractions of reversely-reflected electrons
    3. Determination of samples’ elements composition by electron-probe microanalysis method
    4. E-beam lithography
    5. Equipment
      1. Scanning electronic microscope Auriga CrossBeam
      2. Low-voltage electronic microscope DeLong LVM5
  6. Analysis of nanoparticles dispersions in solutions
    1. Complex dispersion analysis of nano- and submicron particles in solutions 
    2. Particle size distribution 
    3. Measurement of zeta-potential of solution 
    4. Equipment
      1. Dispersion analyser Brookhaven 90BI-Zeta Plus
      2. Analytical module with particle dispersion analyser Malvern Zetasizer Nano
  7. Absorption porometry
    1. Integrated analysis of nano-materials dispersiveness in dry state 
    2. Measurement of total volume and micro and meso-pore surface 
    3. Determination of nanopowders’ specific surface 
    4. Pore-size distribution set-up 
  8. Optical spectroscopic measurements
    1. Measurement and reflective and transmission spectrum analysis in visible, near and far infrared and ultraviolet spectrums areas 
    2. Quantitative chemical analysis of fluorescence and absorbance spectrums 
    3. Absorption bands’ identification in IR spectrum which are related to specific functional groups of organic and polymer materials under analysis 
    4. Equipment
      1. Spectrophotometer Agilent Cary 5000
      2. IR-Fourier spectrometer Thermo Nicolet 6700
  9. Atomic-emission and atomic-absorption spectrometry
    1. Determination of qualitative and quantitative composition of elements 
    2. Samples’ element composition, including aqueous and non-aqueous solutions with simultaneous determination of up to 40 elements in wide concentration range 
    3. Equipment
      1. Inductively Coupled Plasma Atomic Emission Spectrometer  Thermo iCAP 6500 Duo
      2. Atomic-absorption spectrometer Thermo Solaar M6
  10. Gas and liquid chromatography, mass-spectrometry and thermogravimetry
    1. Analysis of fluids’ complex mixtures with identification and components’ quantitative measurements
    2. Differential scanning calorimetry
    3. Differential thermal analysis
    4. Thermogravimetric analysis
    5. Synchronic measurement capabilities with mass-spectrometer analysis in wide temperature range 
    6. Equipment
      1. Gas-chromatograph of high definition with double focusing  Thermo DFS
      2. Hybrid quadrupolar gas-chromatograph UPLC Waters Xevo
      3. Gas-analytical system on basis of quadrupolar mass-spectrometer Netzsch STA 409 Luxx/QMS 403 C
      4. Thermoanalyzer Netzsch STA 409 PC Luxx
      5. Thermal gravimetric analyzer  Perkin Elmer PYRIS 1 TGA
  11. Mechanical tests, thermo-mechanical analysis, dilatometry
    1. Tensile and compression test to determine:
      1. Stress limit
      2. Yield stress
      3. Proportionality limit
      4. Strengthening factor
    2. Linear expansion measurements depending on temperature under controlled force 
    3. Determination of glass-transition, yield and melting temperatures 
    4. Measurements of linear thermal expansion of powders, paints and ceramic fibers 
  12. Rheogoniometry
    1. Simultaneous study of rheological properties (viscosity, tension and sliding velocity) and structure of the deformed systems  
    2. Determination of rheological parameters in a wide temperature range 
  13. Impedance spectroscopy
    1. Measurements of materials’ conductivity, electrolyte-electrode structures and semiconductor heterostructures in a wide frequency band, values of conductivity, temperatures and atmosphere types 
    2. Measurements of magnetic, electric and other materials’ parameters:
      1. saturation induction
      2. coercitive force
      3. magnetic conductivity
      4. hysteresis losses
      5. magnetoresistance
      6. Hall effect
      7. Curie temperature
      8. electrical conductivity
      9. dielectric absorption losses
      10. heat absorptive capacity 
  14. X-ray diffractometry
    1. X-ray-structure and X-ray-phase analysis:
      1. Qualitative and quantitative determination
      2. Phase composition
      3. Crystalline framework and crystallite size in a wide range of temperatures 
    2. Measurements of internal stress and lattice distortion 
  15. Resonance spectroscop
    1. Measurement of electron paramagnetic resonance spectrums  
    2. Measurement of electron-nuclear double resonance spectrums  
    3. Measurement of ferromagnetic resonance spectrums  
  16. Optoelectronics and nanophotonics
    1. Measurement of basic performance (power, energy and beam profile) of laser light sources 
    2. Testing of optoelectronics and nanophotonics elements using laser emission of moderate to high power in visible, infrared and ultraviolet range  
  17. Machine processing
    1. Precise cutting of samples 
    2. High-quality grinding and polishing of different materials’ surfaces 
  18. Photolithography
    1. Obtaining of ultrapure deionized water of analytical quality 
    2. Surface microstructure production by contact lithography method  
    3. Pattern formation in photosensitive resist on wafer surface 
    4. Vacuum application of metals thin films and of dielectrics 
    5. Reactive ion etching 
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