Samples:
Study of morphology, chemical and structural material properties with nanoscale resolution.
Scanning electron microscope with focused ion beam, electron backscatter diffraction (EBSD), energy-dispersive X-ray spectroscopy (EDS), local charge compensation, and E-beam lithography.
Manufacturer: Carl Zeiss NTS, Germany
Year: 2009
Location: 124
Year: 2009
Location: 124
| Main features: | |
| Scanning Electron Microscopy: | |
| Electron gun: | Schottky field emitter |
| Resolution: | 1.0nm @ 15kV, 1.9nm @ 1kV |
| Magnification: | 12x—1000000x |
| Acceleration voltage: | 0.1—30kV |
| Focused Ion Beam: | |
| Ion gun: | Ga liquid metal ion source |
| Resolution: | <2.5nm @ 30kV |
| Magnification: | 300x—500000x |
| Acceleration voltage: | 1.0—30kV |