OPTIwet ST30

Automatic multi-step spin wafer cleaning, resist development, and resist stripping.

Manufacturer: SSE, Germany
Год выпуска: 2007
Комната: 213
Main features:  
Solvent cleaning  
RCA SC1 (NH4OH: H2O2) and Piranha (H2SO4:H2O2)  
    cleaning with heating:  up to 80 °C
Deionized ultrapure water rinsing with heating: up to 80 °C
Spin drying with gaseous Nitrogen  
Max. spin speed:  up to 4000 rpm

The equipment is installed in the clean room (class 100) intended for contact photolithography