Sputtering of multilayer and composite metal, dielectric and magnetic films.
Manufacturer: AJA International, USA
Year: 2008
Location: room 275
Main features: | |
Five independent magnetron sputtering sources | (2 DC and 3 RF power) |
Turbomolecular pumping system | |
vacuum: | not less than 5*10–7 Torr |
Rotating substrate holder | |
heating: | up to 800 °C |
Substrate holder cooled by liquid nitrogen | |
Three independent gas feed lines | |
Computer control system |